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VSP-A Deposition Accessories

Easy & quick sample preparation

The three VSP-A deposition accessories can be easily connected to the output of the VSP-G1, enabling any researcher to produce nanoparticle samples in a matter of hours, with minimal effort. Typical sample preparation time is 1-60 minutes. Go from hypothesis to result in the same day. 


Dispersed particles, Porous layers, Coated filters

With VSPARTICLE Accessories pure nanoparticles are generated and deposited on any kind of substrate. You can make a sample with dispersed particles, a nanoporous layer or coated filters with great material flexibility. You can use any kind of (semi)conductive source material: pure, alloys, compacted alloys, mixed materials, oxides and other combinations. 

 


VSP-A1 Diffusion deposition

  • Dispersed, unagglomerated particles
  • Sample ready in 1-10 minutes
  • From hypothesis to particle sample in less than one hour
  • Sample size 10x10mm
  • Substrate types: e.g. (in-situ) TEM chips, Electrodes, (doped) Si chips
  • Production rate: 1-10mg per hour

VSP-A2 Filtration deposition

  • Mix & match oxides and metallic nanoparticles
  • Collect particles with in-line filter
  • Bottom-up catalyst fabrication
  • Type of substrates: porous membranes, electrospun wires, carbon cloth
  • substrate size ø47mm

VSP-A3 Impaction  deposition

  • Grow a nanoporous oxide layer
  • Useful as catalyst support/sensitive material
  • Type of substrates: glass, Si, TEM grids, MEMS chips etc
  • Max. deposited area: ø3 mm

Testimonial


TECHNOLOGY

The spark ablation process used inside the devices is a purely physical process that only requires electricity, a carrier gas and electrode material to produce clean nanoparticles. No additional chemicals are required for the production or to stabilize the particles in the aerosol. The produced nanoparticles can be directly incorporated into the next process step or applied in a product by, for example, impaction, electrostatic precipitation or filtering. This way the unique physical properties of the nanoparticles are directly available in the product. The carrier gas can simply be recirculated, minimizing the environmental impact of the process.

 

Read more 


User friendly, safe and quick

The most used combinations between accessory, material and substrate for model catalyst and in-situ TEM:

Diffusion: TEM grids, in-situ TEM/MEMS, SiOx
Applications: In-situ TEM catalyst research, materials science, ...
Materials: Metals, Metal oxides, Alloys, Semiconductors, Carbon
Max sample size: 1 cm2

Impaction: TEM grids, in-situ TEM/MEMS, SiOx
Applications: catalysis, in-situ TEM, sensors, batteries
Materials: Metals, Metal oxides, Alloys, Semiconductors, Carbon
Max functionalized surface area: around 3 mm

Filtration: Filters, active carbon membranes, nanospun wires
Applications: catalysis, batteries, filter testing
Materials: Metals, Metal oxides, Alloys, Semiconductors, Carbon
Max filter diameter: 47 mm

TECHNICAL SPECIFICATIONS

Power
110-240 V AC

Dimensions
Casing ca. 47x34x15 cm - Reactor added height ca. 10 cm

Weight
19 kg

Gas inlet/outlet
10 mm tubes (with Swagelok connectors)

Display
OLED

Controls
Manual operation & remote control via RS232

OPERATING WINDOW

Flow rate
1-30 L/min

Gas
Supported: Ar or N2 (recommended purity 5.0)
Unsupported: He, Ne, Xe, Kr
Contact VSPARTICLE for use of reactive gases such as air, H2.

Electrode material
Comes with Cu electrodes.
Various other metals (e.g. Ag, Au, Pt, W, Ni), semiconductors and carbon are possible.

Primary particle size
1 atom to 20 nm
Ablation rate
~0.01-100 mg/h (material dependent)

Typical particle concentration
108-1011 cm-3

  • Tune gas flow to control particle size (0-20 nm)
  • Immobilize nanoparticles on a controlled substrate at the push of a button
  • Mix any conductive and semi-conductive material
  • Sample preparation time reduced to <1 hour
  • No chemicals needed thanks to spark ablation technology
  • Find recommended settings on the VSPARTICLE materials database free tool
  • Store your data on the VSP database and share them with your collaborators

What materials can I use?

You can use any semi-conductive and conductive materials. The material is used in the system in de form of electrodes. By adding air to the gasflow, oxides can be made. Learn more about compatible materials here. Contact us to find out which materials we have in stock. 

What are the sizes that I can make?

The output of the system is 0-20nm particles. By changing the settings, you can tune the size distribution to create particles tailor-made for your application.

Can I make monodisperse particles?

Yes, monodisperse options and samples are available upon request.

What substrates can I deposit them on?

It is possible to deposit on any substrate. Some examples of substrates are: TEM grids, in-situ TEM/MEMS, SiOx, filters, active carbon membranes, nanospun wires. 

How long does it take to make a sample?

Sample preparation typically takes less than an hour from getting a fresh substrate to storing your prepared sample.

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Wilson movie